release policy text changes
Hi,
I started to draft the textual changes to our release policy according
to our meetings results. Please feel free to cluebat me until the texts
are in good shape. :)
Cheers,
Andi
1. DFSG-freeness
Code {+and Documentation+} in main and contrib must meet the DFSG,
both in .debs and in the source (including the .orig.tar.gz).
[-Documentation in main and contrib must be freely distributable,
and wherever possible should be under a DFSG-free license. This
will likely become a requirement post-sarge.-]
[...]
2. Dependencies
Packages in main cannot require any software outside of main
for execution or compilation. [-Packages in contrib, non-free cannot
require any software in non-US.-] "Recommends:" lines do not count as
requirements.
[...]
4. Autobuilding
[...]
debian/rules must include the targets: clean, binary, binary-arch,
binary-indep and build; and these targets cannot require any
interaction with the user. The build target must not do anything that
requires root privileges. {+None of these targets may change the
packages build-dependencies or the changelog.+}
[...]
5. General
[...]
(l) Mail
[...]
MTAs must provide /usr/sbin/sendmail, and a symlink to that
program as /usr/lib/sendmail. {+/usr/sbin/sendmail must provide
the -bs switch, unless the package conflicts with LSB.+}
[...]
(p) Linux Standard Base
Packages must not conflict with requirements of the LSB,
v1.3. (eg, if you provide a library specified in the LSB, you
must be compatible with the LSB specification of that library)
Basically, you should be LSB compatible. You can expect a bug
report to be filed if you're not, and if you don't know how to
fix the problem, you should email debian-lsb@lists.debian.org
for assistance.
{+[Expect that the LSB Version will be bumped to 3 during etch
development.]+}
(q) Python
Packages providing python modules must comply with the python
policy (naming scheme and dependencies). See
http://people.debian.org/~joss/python/python-policy-draft.txt
{+[Expect that the python policy and implementation will change
during the etch development cycle]+}
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